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LPV358DR

  • Available: 12189

Reference Price(In US Dollars)

QtyUnit PriceExt.Price
1+US $0.75000US $0.75
10+US $0.50000US $5.00
30+US $0.37500US $11.25
100+US $0.30000US $30.00
500+US $0.27500US $137.50
1000+US $0.25000US $250.00

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Description
AND APPLICATIONS
The LP3000 is an Aluminum Gallium Arsenide / Indium Gallium Arsenide (AlGaAs/InGaAs) Pseudomorphic High Electron Mobility Transistor (PHEMT), utilizing an Electron-Beam direct-write 0.25 µm by 3000 µm Schottky barrier gate.
The recessed “mushroom” gate structure minimizes parasitic gate-source and gate resistances.
The epitaxial structure and processing have been optimized for reliable high-power applications.
The LP3000 also features Si3N4 passivation and is available with plated source via-holes (LPV 3000) as an option for improved high-frequency performance. Also available in a ceramic flanged package (P100) and ball grid array package.Typical applications include commercial and military high-performance power amplifiers, including SATCOM uplink transmitters, PCS/Cellular low-voltage high-efficiency output amplifiers, and medium-haul digital radio transmitters.
The LPV 3000/LP 3000 may be procured in a variety of grades, depending upon specific user requirements. Standard lot screening is patterned after MIL-STD-19500, JANC grade. Space-level screening to FSS JANS grade is also available.
FEATURES
• +33.5 dBm Typical Power at 18 GHz
• 7 dB Typical Power Gain at 18 GHz
• +30.5 dBm at 3.3V Battery Voltage
• Low Intermodulation Distortion
• 45% Power-Added-Efficiency at 18 GHz
Alternatives

Functional Equivalent (FE) materials, including Fused Filament Fabrication (FFF) form, assembly, and functionally compatible substitute materials.

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